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| 3D Optical Profiler | Characterization | Verner Håkonsen | Bruker | Contour GT -K |
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| 3D printer Ultimaker 2 | Other processes | Mark Chiappa | Ultimaker | Ultimaker 2 |
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| AFM Dimension Icon | Characterization | Verner Håkonsen | Bruker | Dimension Icon |
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| AFM, NanoSurf | Characterization | Verner Håkonsen | Nanosurf | easyScan 2 |
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| AFM, Nanosurf Flex | Characterization | Verner Håkonsen | Nanosurf | easyScan 2 |
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| AFM, Veeco | Characterization | Verner Håkonsen | Veeco Metrology | diMultimode V |
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| ALD | Deposition | Ricardo Matias Trujillo | Veeco | Savannah S200 |
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| Analytical Balances | Chemical methods | Trine Hjertås | Sartorius | TE214S |
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| Autoclave | Chemical methods | Trine Hjertås | Parr Instrument Company | 4564 Mini Bench Top Reactor |
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| CAIBE | Dry etch | Martijn de Roosz | Oxford Instruments | Ionfab 300 Plus (LC) |
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| Calcination (gold) Furnace | Thermal processes | Martijn de Roosz | Thermcraft | TTL-2,25-0-12-1B-J8961/ 1A |
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| Carbon Coater for SEM Sample Prep. | Deposition | Verner Håkonsen | Cressington | 208 Carbon |
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| Centrifuge (Table top) | Chemical methods | Mathilde Barriet | Heraeus | Labofuge 400R, art.no. 75008164 |
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| Chemical area course | Other processes | Trine Hjertås | - | - |
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| Chemical stations in lito area | Lithography | Mathilde Barriet | PM Plast | PM Plast |
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| CVD | Deposition | Martijn de Roosz | Graphene Square | TA100 |
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| DIC microscope | Characterization | Verner Håkonsen | Carl Zeiss | Zeiss AxoScope A1 for Reflected light BF- DIC/POL |
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| Dip Coater | Deposition | Mathilde Barriet | NIMA Technology | DC-mono-75, type D1L-75 |
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| DRIE (Deep Si-etcher) | Dry etch | Martijn de Roosz | SPTS | Rapier |
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| Drop Shape Analyser DSA25 | Characterization | Mathilde Barriet | Kruss | DSA25 |
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| Drying Oven 1 | Thermal processes | Trine Hjertås | Termaks | TS 8056 |
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| Drying Oven 2 | Thermal processes | Trine Hjertås | Termaks | TS 8056 |
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| Drying Oven 3 (Small) | Thermal processes | Trine Hjertås | Termaks | TS 8024 |
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| E Beam Evaporator - K.J. Lesker | Deposition | Ricardo Matias Trujillo | K.J. Lesker | PVD 200 |
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| E Beam evaporator & Sputter AJA | Deposition | Martijn de Roosz | AJA International Inc. | Custom ATC-2200V |
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| E-Beam Evaporator - Pfeiffer | Deposition | Martijn de Roosz | Pfeiffer | Vacuum Classic 500 |
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| EBL Elionix | Lithography | Mark Chiappa | Elionix | ELS-G100 |
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| EBL Elionix workstation | Lithography | Mark Chiappa | Elionix | ELS-G100 |
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| Electroplating System | Deposition | Mathilde Barriet | Yamamoto | A-52-ST2W-YTC300 |
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| EMS Hotplates in Litho | Lithography | Mark Chiappa | EMS | Twin 4" and 6" |
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| FIB G4 (Advanced level) | Characterization | Verner Håkonsen | FEI | Helios G4 UX |
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| Fluorescence microscope | Characterization | Verner Håkonsen | Carl Zeiss | Axio Scope.A1 430035-9120-000 |
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| Focused Ion Beam (FIB G2) | Characterization | Verner Håkonsen | FEI Company | Helios Nanolab |
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| Fume Hood 4 | Chemical methods | Trine Hjertås | - | - |
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| Fume Hood 5 | Chemical methods | Trine Hjertås | - | - |
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| Fume Hood 6 | Chemical methods | Trine Hjertås | - | - |
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| Glove Box Nitrogen | Chemical methods | Mathilde Barriet | Mbraun | UNI lab |
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| Hardware Interlock Test Tool | Other processes | Verner Håkonsen | HITT | 2000X |
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| Hardware Interlock Test Tool 2 | Other processes | Verner Håkonsen | HITT | 2000 |
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| HF buddy | Chemical methods | Trine Hjertås | NanoLab | NanoLab |
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| HF fume hood | Chemical methods | Trine Hjertås | PM Plast | - |
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| HF Vapor Release Etcher | Dry etch | Ricardo Matias Trujillo | SPTS | uEtch |
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| ICP-RIE 1 (Chlorine) | Dry etch | Martijn de Roosz | SPTS | Omega LPX |
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| ICP-RIE 2 (Fluorine) | Dry etch | Martijn de Roosz | SPTS | Omega LPX |
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| JEOL SEM | Characterization | Verner Håkonsen | JEOL | JSM-6480LV |
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| LAF Safety Bench | Bionano | Mathilde Barriet | Kojair | LAF safety bench |
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| Laminar Flow Bench 1 | Chemical methods | Trine Hjertås | Fortuna | 1.2 |
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| Laminar Flow Bench 2 | Chemical methods | Trine Hjertås | Fortuna | 1.2 |
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| Laminar Flow Bench 3 | Chemical methods | Trine Hjertås | Fortuna | 0.9 |
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| Langmuir Blodgett trough | Chemical methods | Mathilde Barriet | KSV | NIMA |
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| Lithography Course | Other processes | Mark Chiappa | - | - |
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| Manual Wafer Scriber | Sample preparation | Martijn de Roosz | Süss | MS100 |
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| Maskaligner MA6 | Lithography | Mark Chiappa | Karl Süss | MA6 |
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| MiBots (micromanipulators) | Characterization | Verner Håkonsen | Imina Technologies | MiBot BT-11-VP (Vacuum compatible) |
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| Micro-Raman Spectroscopy | Characterization | Trine Hjertås | Renishaw | InVia Reflex Spectrometer System |
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| Microscope | Bionano | Verner Håkonsen | Carl Zeiss | Primo star |
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| Microscope | Bionano | Verner Håkonsen | Carl Zeiss | Primo star |
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| Microscope | Bionano | Verner Håkonsen | Carl Zeiss | Primo star |
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| Microwave Oven | Thermal processes | Trine Hjertås | Anton Paar | Multiwave 3000 |
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| MLA 100 | Other processes | Mark Chiappa | Heidelberg | MLA100 |
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| MLA 150 | Lithography | Mark Chiappa | Heidelberg | MLA150 |
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| NanoDrop UV vis spectrophotometer | Characterization | Trine Hjertås | Thermo Fischer | One/One CRM:0070121 |
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| Nanoimprinter SCIL | Lithography | Mark Chiappa | Karl Süss | SCIL |
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| Nanosight Nanoparticle Analysis System | Characterization | Trine Hjertås | Nanosight | LM10 and LM10HS |
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| Ovens for Lithography Processes | Lithography | Mark Chiappa | Memmert | U26 |
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| Particle size analyser | Characterization | Trine Hjertås | Beckman Coulter | N5 Submicron Particle Size Analyzer |
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| PDMS Area | Bionano | Mathilde Barriet | Termaks | TS 8024 |
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| PECVD | Deposition | Martijn de Roosz | Oxford Instruments | PlasmaLab System 100-PECVD |
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| PECVD 2 | Deposition | Ricardo Matias Trujillo | SPTS | Delta APM |
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| pH-meter | Chemical methods | Trine Hjertås | WTW | inoLab pH 730 |
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| Plasma Cleaner | Dry etch | Verner Håkonsen | Diener Electronics | Femto |
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| Profilometer (Stylus) | Characterization | Verner Håkonsen | Veeco | Dektak 150 |
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| Reflectometer | Characterization | Mark Chiappa | Filmetrics | F20 |
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| Rotary evaporators | Chemical methods | Trine Hjertås | Heidolph | Laborota 4000/ G4 bad |
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| RTP Allwin 1 Organic | Thermal processes | Mathilde Barriet | Allwin21 | AW610 |
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| RTP Allwin 2 Inorganic | Thermal processes | Mathilde Barriet | ALLWIN21 | AW610 |
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| S(T)EM | Characterization | Verner Håkonsen | Hitachi High-Tech | SU9000 |
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| SCIL Replication tool | Lithography | Mark Chiappa | Sûss | MRT |
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| Scriber | Sample preparation | Martijn de Roosz | Dynatex | DXIII |
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| SECM | Characterization | Trine Hjertås | Princeton Applied Research | 370 |
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| SEM (Table Top) | Characterization | Verner Håkonsen | Hitachi | TM3000 Tabletop microscope |
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| SEM Apreo | Characterization | Verner Håkonsen | FEI | APREO |
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| Shaking platform (orbital) | Chemical methods | Trine Hjertås | Grant-bio | POS-300 |
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| SMU | Characterization | Verner Håkonsen | Kiethley | Series 2400 Source Meter |
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| Spin coater | Chemical methods | Mathilde Barriet | Laurell Technologies | WS-400B-6NPP-LITE/ AS |
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| Spin Coater Corrosive Fumehood | Other processes | Mathilde Barriet | Laurell | WS-650 |
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| Sputter Coater and Thermal Evaporator | Deposition | Martijn de Roosz | Cressington | 308R |
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| Sputter Coater for SEM Sample Prep. | Deposition | Verner Håkonsen | Cressington | 208 HR B |
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| Stereomicroscope | Characterization | Trine Hjertås | Nikon | Nikon SMZ460/SMZ800 |
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| STM 1, Nanosurf | Characterization | Verner Håkonsen | Nanosurf | easyScan 2 |
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| STM 2, Nanosurf | Characterization | Verner Håkonsen | Nanosurf | easyScan 2 |
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| STM 3, Nanosurf | Characterization | Verner Håkonsen | Nanosurf | easyScan 2 |
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| Syringe Pump Fusion | Bionano | Mathilde Barriet | Chemyx | Fusion 400 |
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| Syringe pump KDS | Chemical methods | Mathilde Barriet | kdScientific | KDS-200-CE |
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| Syringe Pump Nexus | Bionano | Mathilde Barriet | Chemyx | Nexus 3000 |
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| Table Top Centrifuge | Chemical methods | Mathilde Barriet | Hermle | Z 326 K |
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| TePla plasma asher | Dry etch | Martijn de Roosz | PVA | TePla 300 |
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| Ultracentrifuge | Chemical methods | Trine Hjertås | Sorvall | WX Ultra 100 |
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| Ultrasonic Disintegrator 1 | Chemical methods | Trine Hjertås | Branson Sonifier | 450 CE Digital |
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| Ultrasonic Disintegrator 2 | Chemical methods | Trine Hjertås | Branson Sonifier | 450 CE Digital |
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| UV Ozone Cleaner | Bionano | Mark Chiappa | Novascan | PSD PRO-UV T6 |
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| Vacuum Oven 1 | Thermal processes | Trine Hjertås | Binder | VD 23 |
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| Vacuum Oven 3 | Thermal processes | Trine Hjertås | Binder | VD 23 |
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| Wafer saw Disco 3220 | Other processes | Mark Chiappa | Disco | DAD |
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| Wet Etch Course | Other processes | Mathilde Barriet | - | - |
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| Wire Bonder | Bonding and packaging | Verner Håkonsen | TPT | HB05 Wedge and Ball Bonder |
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| Yellow Light Microscope | Lithography | Mark Chiappa | Nikon | Eclipse LV150 |