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 NameCategory1st responsibleManufacturerModel
View 3D Optical ProfilerCharacterizationVerner HåkonsenBrukerContour GT -K
View 3D printer Ultimaker 2Other processesVerner HåkonsenUltimakerUltimaker 2
View AESSurface analysisVerner HåkonsenJEOLJAMP 9500F
View AFM Dimension IconCharacterizationVerner HåkonsenBrukerDimension Icon
View AFM, NanoSurfCharacterizationVerner HåkonsenNanosurfeasyScan 2
View AFM, Nanosurf FlexCharacterizationVerner HåkonsenNanosurfeasyScan 2
View AFM, VeecoCharacterizationVerner HåkonsenVeeco MetrologydiMultimode V
View ALDDepositionMark ChiappaVeecoSavannah S200
View Analytical BalancesChemical methodsTrine HjertåsSartoriusTE214S
View AutoclaveChemical methodsTrine HjertåsParr Instrument Company4564 Mini Bench Top Reactor
View CAIBEDry etchMartijn de RooszOxford InstrumentsIonfab 300 Plus (LC)
View Calcination (gold) FurnaceThermal processesMartijn de RooszThermcraftTTL-2,25-0-12-1B-J8961/ 1A
View Carbon Coater for SEM Sample Prep.DepositionVerner HåkonsenCressington208 Carbon
View Centrifuge (Table top)Chemical methodsMathilde BarrietHeraeusLabofuge 400R, art.no. 75008164
View Chemical area courseOther processesTrine Hjertås--
View Chemical stations in lito areaLithographyMathilde BarrietPM PlastPM Plast
View CVDDepositionMartijn de RooszGraphene SquareTA100
View DIC microscopeCharacterizationVerner HåkonsenCarl ZeissZeiss AxoScope A1 for Reflected light BF- DIC/POL
View Dip CoaterDepositionMathilde BarrietNIMA TechnologyDC-mono-75, type D1L-75
View Drop Shape Analyser DSA25CharacterizationMathilde BarrietKrussDSA25
View Drying Oven 1Thermal processesTrine HjertåsTermaksTS 8056
View Drying Oven 2Thermal processesTrine HjertåsTermaksTS 8056
View Drying Oven 3 (Small)Thermal processesTrine HjertåsTermaksTS 8024
View E Beam Evaporator - K.J. Lesker DepositionMartijn de RooszK.J. LeskerPVD 75 Custom
View E Beam evaporator & Sputter AJADepositionMartijn de RooszAJA International Inc.Custom ATC-2200V
View E-Beam Evaporator - PfeifferDepositionMartijn de RooszPfeifferVacuum Classic 500
View EBL ElionixLithographyMark ChiappaElionixELS-G100
View Electroplating SystemDepositionMathilde BarrietYamamotoA-52-ST2W-YTC300
View FIB G4 (Advanced level)CharacterizationVerner HåkonsenFEIHelios G4 UX
View Fluorescence microscopeCharacterizationVerner HåkonsenCarl ZeissAxio Scope.A1 430035-9120-000
View Focused Ion Beam (FIB G2) CharacterizationVerner HåkonsenFEI CompanyHelios Nanolab
View Fume Hood 4Chemical methodsTrine Hjertås--
View Fume Hood 5Chemical methodsTrine Hjertås--
View Fume Hood 6Chemical methodsTrine Hjertås--
View Glove Box NitrogenChemical methodsMathilde BarrietMbraunUNI lab
View HF buddyChemical methodsTrine HjertåsNanoLabNanoLab
View HF fume hoodChemical methodsTrine HjertåsPM Plast-
View ICP-RIE ChillerDry etchMartijn de RooszOxford InstrumentsPlasmalab System 100 ICP-RIE 180
View ICP-RIE CryoDry etchMartijn de RooszOxford InstrumentsPlasmaLab System 100-ICP180
View JEOL SEMCharacterizationVerner HåkonsenJEOLJSM-6480LV
View LAF Safety BenchBionanoTrine HjertåsKojairLAF safety bench
View Laminar Flow Bench 1Chemical methodsTrine HjertåsFortuna1.2
View Laminar Flow Bench 2Chemical methodsTrine HjertåsFortuna1.2
View Laminar Flow Bench 3Chemical methodsTrine HjertåsFortuna0.9
View Langmuir Blodgett troughChemical methodsMathilde BarrietKSVNIMA
View Lithography CourseOther processesMark Chiappa--
View Manual Wafer ScriberSawingMartijn de RooszSüssMS100
View Mask Aligner MJB3LithographyMark ChiappaKarl Süss KSM MJB-3 HP
View Maskaligner MA6LithographyMark ChiappaKarl SüssMA6
View MiBots (micromanipulators)CharacterizationVerner HåkonsenImina TechnologiesMiBot BT-11-VP (Vacuum compatible)
View Micro-Raman SpectroscopyCharacterizationTrine HjertåsRenishawInVia Reflex Spectrometer System
View MicroscopeBionanoVerner HåkonsenCarl ZeissPrimo star
View MicroscopeBionanoVerner HåkonsenCarl ZeissPrimo star
View MicroscopeBionanoVerner HåkonsenCarl ZeissPrimo star
View Microwave OvenThermal processesTrine HjertåsAnton PaarMultiwave 3000
View MLA 100LithographyMark ChiappaHeidelbergMLA100
View MLA 150LithographyMark ChiappaHeidelbergMLA150
View NanoDrop UV vis spectrophotometerCharacterizationTrine HjertåsThermo FischerOne/One CRM:0070121
View Nanoimprinter SCILLithographyMark ChiappaKarl SüssSCIL
View Nanosight Nanoparticle Analysis SystemCharacterizationTrine HjertåsNanosight LM10 and LM10HS
View Ovens for Lithography ProcessesLithographyMark ChiappaMemmertU26
View Particle size analyserCharacterizationTrine HjertåsBeckman CoulterN5 Submicron Particle Size Analyzer
View PC-room K1-148Sample preparationKen Roger ErvikNTNU NANOLABNTNU NANOLAB
View PDMS AreaBionanoMathilde BarrietTermaksTS 8024
View PECVDDepositionMartijn de RooszOxford InstrumentsPLasmaLab System 100-PECVD
View pH-meterChemical methodsTrine HjertåsWTWinoLab pH 730
View Plasma CleanerDry etchVerner HåkonsenDiener ElectronicsFemto
View Profilometer (Stylus)CharacterizationVerner HåkonsenVeecoDektak 150
View ReflectometerCharacterizationMark ChiappaFilmetricsF20
View Rotary evaporatorsChemical methodsTrine HjertåsHeidolphLaborota 4000/ G4 bad
View RTP Allwin 1 OrganicThermal processesMathilde BarrietAllwin21AW610
View RTP Allwin 2 InorganicThermal processesMathilde BarrietALLWIN21AW610
View S(T)EMCharacterizationVerner HåkonsenHitachi High-TechSU9000
View SCIL Replication toolLithographyMark ChiappaSûssMRT
View ScriberSample preparationMartijn de RooszDynatexDXIII
View SECMCharacterizationTrine HjertåsPrinceton Applied Research370
View SEM (Table Top)CharacterizationVerner HåkonsenHitachiTM3000 Tabletop microscope
View SEM APREOCharacterizationVerner HåkonsenFEIAPREO
View Shaking platform (orbital)Chemical methodsTrine HjertåsGrant-bioPOS-300
View SMUCharacterizationVerner HåkonsenKiethleySeries 2400 Source Meter
View Spin coaterChemical methodsMathilde BarrietLaurell TechnologiesWS-400B-6NPP-LITE/ AS
View Spin Coater Corrosive FumehoodOther processesMathilde BarrietLaurellWS-650
View Sputter Coater and Thermal EvaporatorDepositionMartijn de RooszCressington308R
View Sputter Coater for SEM Sample Prep.DepositionMartijn de RooszCressington208 HR B
View StereomicroscopeCharacterizationTrine HjertåsNikonNikon SMZ460/SMZ800
View STM 1, NanosurfCharacterizationVerner HåkonsenNanosurfeasyScan 2
View STM 2, NanosurfCharacterizationVerner HåkonsenNanosurfeasyScan 2
View STM 3, NanosurfCharacterizationVerner HåkonsenNanosurfeasyScan 2
View Syringe Pump FusionBionanoMathilde BarrietChemyxFusion 400
View Syringe pump KDSChemical methodsMathilde BarrietkdScientificKDS-200-CE
View Syringe Pump NexusBionanoMathilde BarrietChemyxNexus 3000
View Table Top CentrifugeChemical methodsMathilde BarrietHermleZ 326 K
View TePla plasma asherDry etchMartijn de RooszPVATePla 300
View UltracentrifugeChemical methodsTrine HjertåsSorvallWX Ultra 100
View Ultrasonic Disintegrator 1Chemical methodsTrine HjertåsBranson Sonifier450 CE Digital
View Ultrasonic Disintegrator 2Chemical methodsTrine HjertåsBranson Sonifier450 CE Digital
View UV Ozone CleanerBionanoMark ChiappaNovascanPSD PRO-UV T6
View Vacuum Oven 1Thermal processesTrine HjertåsBinderVD 23
View Vacuum Oven 3Thermal processesTrine HjertåsBinderVD 23
View Wafer saw Disco 3220Other processesMark ChiappaDiscoDAD
View Wet Etch CourseOther processesMathilde Barriet--
View Wire BonderBonding and packagingVerner HåkonsenTPTHB05 Wedge and Ball Bonder
View XPSSurface analysisVerner HåkonsenKratos AnalyticalAxis Ultra DLD
View XPS Catalyst chamberSurface analysisSverre PettersenKratos AnalyticalAxis Ultra DLD
View Yellow Light MicroscopeLithographyMark ChiappaNikonEclipse LV150
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