The Elionix ELS-G100 is a 100KV EBL system with a 100MHz pattern generator.

The system has 2 SE, 1 BSE detectors, a height sensor to keep your sample in focus during exposure, and dynamic Focus and Stigmator adjustment to optimise beam shape at the edges of the field.

Write field sizes @ 100KV are 100µm, 250µm, 500µm, 1000µm.  Larger write fields can be arranged after consultation with the responsible engineer if required.

Beam diameter starts at 1.8nm @100pA. Beam current is selectable from 100pA up to 100nA.

Sample sizes are possible from 3X3 mm up to full 8" wafers. There is also a cassette for Photo mask writing (inquire for further details).

Objective apertures are 60, 120 and 240µm