Picture of MLA 150
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AVAILABLE
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The MLA150 Maskless aligner is a direct laser write tool. Two laser sources 405nm and 375nm. So all NanoLab photoresists are compatible with the system. Capable of exposing substrates from 5mm X 5mm up to full 6” wafers or masks. Substrate thickness must be between 0.1 and 6mm. The system has a topside alignment accuracy of 500nm and backside of 1µm. Minimum line width is 1µm. The system accepts GDSII, CIF, Gerber and DXF formats.

Tool name:
MLA 150
Area/room:
Lithography & Wet Etch
Category:
Lithography
Manufacturer:
Heidelberg
Model:
MLA150
Tool rate:
A

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