The NanoFrazot from HIMT is a Thermal Scanning Probe Lithography (t-SPL) system.  Here a hot “AFM” cantilever is used to modify a surface in a controlled manner.  Typically by sublimating a resist but the system may be used without resist.  The system has a 60µm X 60µm writing area.  These areas can be stitched together.  The results are scanned as they are written allowing closed loop lithography (CLL).  Process correttions can ba applied automatically during writing.

We have several upgrdes.

DLS. Direct laser sublimation.  A 405nm Laser can be used instaed of or in conjunction with the cantilever to pattern larger areas.

Greyscale.  Uses CLL at multiple depth levels. 

Smart splitting. Includes various options and parameters to split a large layout into writing fields for optimised stitching and write time.

Automatic overlay. Automatic detection of exising features at assigned locations and aligns the tip at the best position for patterning to follow a given layout.