Maskaligners are used in photolithography to transfer a pattern on a photomask to a photoresist on a wafer. This photoresist can then serve as e.g. an etch mask to transfer the pattern into the wafer. The photoresist can also be removed after metal deposition, leaving a metal pattern on the wafer (lift-off). The resolution is far into the submicron region.This maskaligner is mostly used in student courses and is placed in the ISO7 area.
Maskholders for 3″ and 4″ masks are available.
Samples can be up to 3″ in diameter and have a thickness of up to 4,5 mm.