uEtch or “yoo-etch” is a HF gas etching tool. Standard wet chemical HF etching can cause "stiction" by pulling the free moving microstructures together which remain adhered to each other after release, reducing device yields.
A gaseous etchant penetrates smaller features more easily and allows longer undercuts.
Alcohol (A) ionises the HF vapor and acts as a catalyst:
SiO2 (s) + 2HF2- (ads) + 2AH+ (ads) → SiF4 (ads) + 2H2O (ads) + 2A (ads)
The etch process is run at a constant temperature of 45 °C.
Gases: HF, EtOH, N2.
Key technology benefits:
- Eliminates stiction–repeatable, controlled, low-cost process.
- Compatible with many metals/typical MEMS materials (Al).
- Uses anhydrous HF, semi grade alcohol (ethanol).
Etch rates (isotropic)
- Variable T, P, reagent flows –wide etch rate range.
- 0.05 um/min (dense oxides, small spaces) to >> 1 um/min.
- Maximum rate limited by exposed metals, SiO2 area and uniformity needs.
- Oxide types (densities), not compatible with doped oxides.
- Not compatible with Cu, Ti, TiO2