Picture of HF Vapor Release Etcher
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uEtch or “yoo-etch” is a HF gas etching tool. Standard wet chemical HF etching can cause "stiction" by pulling the free moving microstructures together which remain adhered to each other after release, reducing device yields.

A gaseous etchant penetrates smaller features more easily and allows longer undercuts.

Alcohol (A) ionises the HF vapor and acts as a catalyst:

SiO2 (s) + 2HF2- (ads) + 2AH+ (ads) → SiF4 (ads) + 2H2O (ads) + 2A (ads)

The etch process is run at a constant temperature of 45 °C.

Gases: HF, EtOH, N2.

Key technology benefits:

  • Eliminates stiction–repeatable, controlled, low-cost process.
  • Compatible with many metals/typical MEMS materials (Al).
  • Uses anhydrous HF, semi grade alcohol (ethanol).

Etch rates (isotropic)

  • Variable T, P, reagent flows –wide etch rate range.
  • 0.05 um/min (dense oxides, small spaces) to >> 1 um/min.
  • Maximum rate limited by exposed metals, SiO2 area and uniformity needs.
  • Oxide types (densities), not compatible with doped oxides.
  • Not compatible with Cu, Ti, TiO2

 

Tool name:
HF Vapor Release Etcher
Area/room:
Thin Film & Dry Etch
Category:
Dry etch
Manufacturer:
SPTS
Model:
uEtch
Tool rate:
A

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