Picture of TePla plasma asher
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The TePla 300 Plasma asher can be used to strip off photo resist, descum or for cleaning of a wafer surface. 

Available process gases: O2, Ar, N2

Maximum power: 1000W

Tool name:
TePla plasma asher
Area/room:
Chemical area
Category:
Dry etch
Manufacturer:
PVA
Model:
TePla 300
Tool rate:
A
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

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