Picture of MLA 100
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AVAILABLE
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The MLA100 Maskless aligner is a direct write tool. It’s the little brother to our MLA 150. The illumination is provided by a 10W 365nm UV LED so all NanoLab photoresists are compatible with the system. Capable of exposing substrates from 5mm X 5mm up to full 5” wafers or masks. Substrate thickness must be between 0.1 and 5mm. The system has a topside alignment accuracy of 1µm.   Minimum line width is 1µm. The system accepts GDSII, CIF, BMP and DXF formats.  It’s also capable greyscale lithography.

Tool name:
MLA 100
Area/room:
Student Lab
Category:
Lithography
Manufacturer:
Heidelberg
Model:
MLA100
Tool rate:
A
Max booking time, day:
16 hours
Max booking time, night:
20 hours
No. of future bookings:

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