Picture of MLA 150
Current status:
AVAILABLE
Book | Log
Show/Collapse all

1st Responsible:
2nd Responsible:
You must be logged in to view files.

The MLA150 Maskless aligner is a direct laser write tool. Two laser sources 405nm and 375nm. So all NanoLab photoresists are compatible with the system. Capable of exposing substrates from 5mm X 5mm up to full 6” wafers or masks. Substrate thickness must be between 0.1 and 6mm. The system has a topside alignment accuracy of 500nm and backside of 1µm. Minimum line width is 1µm. The system accepts GDSII, CIF, Gerber and DXF formats.

Tool name:
MLA 150
Area/room:
Lithography & Wet Etch
Category:
Lithography
Manufacturer:
Heidelberg
Model:
MLA150
Tool rate:
A
Max booking time, day:
120 hours
Max booking time, night:
300 hours
No. of future bookings:
4

Instructors

Licensed Users

You must be logged in to view tool modes.