Picture of Mask Aligner MJB3
Current status:
AVAILABLE
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Maskaligners are used in photolithography to transfer a pattern on a photomask to a photoresist on a wafer. This photoresist can then serve as e.g. an etch mask to transfer the pattern into the wafer. The photoresist can also be removed after metal deposition, leaving a metal pattern on the wafer (lift-off). The resolution is far into the submicron region.This maskaligner is mostly used in student courses and is placed in the ISO7 area. 

Sample Specifications:

Maskholders for 3″ and 4″ masks are available.

Samples can be up to 3″ in diameter and have a thickness of up to 4,5 mm.

Tool name:
Mask Aligner MJB3
Area/room:
Student Lab
Category:
Lithography
Manufacturer:
Karl Süss
Model:
KSM MJB-3 HP
Tool rate:
Zero

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Licensed Users

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